Semiconductor Laboratory

Additive and Subtractive Direct-Write Nanofabrication

The focus of this lab-course lies on focused particle beam based micro- and nano-structuring. On the one hand, focused ion beams (FIB) are used for subtractive structuring of material surface, which effectively works like a nano-scalpel. In contrast, the participants are introduced into additive direct-write fabrication using focused electron beams in combination with gaseous precursor, called focused electron beam induced deposition (FEBID). The latter is furthermore one of the very few techniques, which allow the controlled fabrication of even complex, freestanding 3D micro- and nano-architectures with feature sizes down to 30 nm.